Micro-Epsilon sensor measures 300 mm wafer warpage in one capture
The reflectCONTROL RCS3500-300 uses deflectometry to check bow and planarity on wafers up to 300 mm, with capture times from 1 s and no stitching.
Wafer, mask and package metrology and inspection for chipmaking, from overlay and film thickness to X-ray and e-beam inspection, and the deals reshaping the equipment suppliers.
The reflectCONTROL RCS3500-300 uses deflectometry to check bow and planarity on wafers up to 300 mm, with capture times from 1 s and no stitching.